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TENSILE AND ADHESIVE STRENGTHS OF FINE TiN FILM ON Ti SUBSTRATE

LIU Changqing , LI Meishuan , JIN Zhujing , WU Weitao Corrosion Science Laboratory , Institute of Corrosion and Protection of Metals , Academia Sinica , Shenyang , China research assistant , Institute of Corrosion and Protection of Metals , Academia Sinica , Shenyang 110015 , China

金属学报(英文版)

The cantilever bending test,particularly monitored by an acoustic emission technique, was adopted to measure the tensile and interfacial adhesive strengths of the HCD ion plated fine TiN film on pure Ti substrate.The behaviors of film damaging were found to be characterized by:an internal tensile stress which exceeded its tensile strength for TiN facing upward,and a shearing stress along film substrate interface which exceeded its adhesive strength for TiN facing downward.The measured tensile and adhcsive strengths are 603 and 242 MPa respectively.

关键词: tensile strength , null , null , null

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